2022/05/12

Letters of Hong-Yang CHUANG and Yi Lin LEE to WIN Semiconductors Posted According to Criminal Judgment of Intellectual Property and Commercial Court No. 110-Shin-Shang-Chung-Su-1

During my tenure at ATOM Semiconductor Co., Ltd., without consent of WIN Semiconductors Corp. (WIN Semi), I, Hong-Yang CHUANG, instructed another defendant, Yi-Lin LEE, to misappropriate critical VCSEL film deposition recipes of WIN Semi contained in atomic layer deposition equipment (ALD-D02) located at WIN’s Guishan wafer fab when assisting maintenance and repair of ALD-D03 tool performed by an engineer of Picosun Oy. The recipes are trade secrets of WIN Semiconductors. I am deeply remorseful for the misconduct, have reflected on it, and hereby apologize to WIN Semiconductors.

Hong-Yang CHUANG /s/




During my tenure at ATOM Semiconductor Co., Ltd., without consent of WIN Semiconductors Corp. (WIN Semi), I, Yi Lin LEE, misappropriated critical film deposition recipes of WIN contained in Atomic Layer Deposition equipment (ALD-D02) located at WIN Semi’s Guishan wafer fab when assisting maintenance and repair of ALD-D03 tool performed by an engineer of Picosun Oy. The recipes are trade secrets of WIN Semi. I am deeply remorseful for the misconduct, have reflected on it, and hereby apologize to WIN Semi.

Yi Lin LEE/s/