Sep 21, 2007 –WIN Semiconductors Corporation (Taiwan) recently placed an order with Vistec Electron Beam GmbH for a SB250 Variable Shaped Beam System. Delivery and installation of the system is set for 2008.
WIN’s 6” GaAs foundry is one of the most advanced production lines in the industry for volume production of III/V devices. This order represents a follow-on purchase of a Vistec (formerly Leica Microsystems) Shaped Beam Lithography system by WIN.
“Thanks to its fully automated operation, excellent reliability, and comprehensive on-site support by the Vistec team, the previous system could be seamlessly integrated into our production process”, Dr. Der-Wei Tu , WIN Senior Vice President and Chief Technology Advisor said in a statement.
“This second electron beam lithography system from Vistec will help us to meet not only current production demands, but also develop products featuring 100 nm gate length,” Dr. Tu explained.
“We are pleased to provide WIN Semiconductors with an additional advanced lithographic e-beam tool. This again proves that our direct write technology has been validated in advanced production environment,” said Wolfgang Dorl, General Manager of Vistec Electron Beam GmbH. “This order lays the basis for a further mutually beneficial and a win-win situation for both parties.”
WIN Semiconductors Corporation (Taiwan)
WIN Semiconductors Corporation (WIN) is a leading pure-play and dedicated GaAs RFIC/MMIC wafer foundry services provider with an advanced 6-inch wafer fab. The facility is ISO9001/QS9000/ISO14001/OHSAS18001 certified. WIN offers a wide spectrum of technologies for applications from 800 MHz to 100 GHz, including HBT, pHEMT, pHEMT Switch and mHEMT. WIN has been established more than eight years with proven track record of producing high performance RFICs and MMICs for its customers, to various industries from handset (PA and switch) and WLAN (PA and switch) to satellite communications and automotive radar MMICs. WIN customers include major IDM, fabless design and module/system companies. WIN is headquartered at No. 69, Technology 7th Road, Hwaya Technology Park, Kuei Shan Hsiang, Tao Yuan Shien, Taiwan, Republic of China. Visit the WIN website www.winfoundry.com for more information.
Vistec Electron Beam Lithography Group
Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on shaped beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.
Vistec Lithography develops, manufactures and sells electron-beam lithography equipment based on Gaussian beam technology. Their electron beam systems are world-wide accepted in advanced research laboratories and universities.
The Vistec Electron Beam Lithography Group is part of the Vistec Group which consists of three business units:
· Vistec Semiconductor Systems GmbH – located in Weilburg, Germany
· Vistec Electron Beam GmbH - located in Jena, Germany
· Vistec Lithography Inc. - located in Watervliet, N.Y., USA
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