2007.09.21 WIN Semiconductors orders Vistec¡¦s SB250 E-Beam Writer
2007.07.13 WIN Semiconductors Releases New Foundry DesignKits for use with Agilent¡¦s Advanced Design System
2004.10.26 WIN Semiconductors Revenue Keeps Growing
2004.09.10 TO-FEL and WIN Semiconductors Strategic Alliance
2003.11.24 RF Integration and WIN Semiconductors form Strategic Alliance
2003.06.10 WIN Semiconductors Announces the Election of Mr. Dennis Chen as the new Chairman of the BOD
2003.04.30 WIN Semiconductors and ACCO Jointly Announce Strategic Alliance
2003.02.11 AWR and WIN Semiconductors Announce EDA Support for Power pHEMT
2002.12.16 WIN Semiconductors and Roke Manor Research Jointly Announce Strategic Alliance
2002.12.09 WIN Semiconductors Offers Free, Comprehensive ADS Design Kit for 0.15 um Power PHEMT Process
2002.11.05 WIN Semiconductors ISO14001 & OHSAS18001
2002.01.28 Raytheon and WIN Semiconductors Jointly Signed Agreements on Wafer Production and Share Purchase Drop-
2002.01.23 WIN 6" Fab sets Record for GaAs HBT Performance Japanese IDM
2001.10.08 WIN's QS-9000 and ISO 9001 Quality Certification Set the Standard for GaAs MMIC Foundry Service
2001.05.03 WIN Semiconductors Signs NT$1.2 Billion Syndicated Term Loan
2001.03.15 WIN Semiconductors Unveils the World's First, 6-inch, 0.15 micron GaAs pHEMT MMIC Wafer
2001.02.14 WIN Semiconductors' Core Technologies
2000.12.12 WIN Semiconductors' GaAs MMIC Wafer Fab Is Officially Opened - Leading The Industry Into The Era of 6" Wafer Foundry Services
2000.11.15 WIN Semiconductors Successfully Produces the First, 6-inch, GaAs MMIC wafer in Asia
2000.06.07 WIN Semiconductors Corp. is to Raise its Capital Investment. The 1st 6-inch GaAs MMIC Fab in ASIA Will Be Coming Soon
 

2001/02/04 WIN Semiconductors' Core Technologies


HBT (Heterojunction Bipolar Transistor) technology is the most popular technology for the Power Module, the most critical component, used in the rapidly growing Cellular and PCS handset market.

pHEMT (Pseudomorphic High Electron Mobility Transistor) is most popular for the higher frequency, higher performance wireless communications and for the low voltage handset market.

GaAs' (Gallium Arsenide) intrinsic RF (radio frequency) characteristics make it suitable for the wireless communications applications. Its superior performance is unmatched by either the emerging SiGe (Silicon Germanium) or Silicon RF CMOS. WIN Semiconductors successfully demonstrated the 2um InGaP (Indium Gallium Phosphide) HBT last month. We are developing the 1um HBT technology and will introduce to the market in 2001. HBT technology has been widely accepted in the cellular handset, optical communications and certain lower frequency wireless products, such as two-way pager, WLAN (Wireless Local Area Network), etc.

pHEMT technology will be the key technology for the major components used in the broadband and high performance communications products, such as in the microwave frequency 1.8-2.0 GHz, 2.1-2.2 GHz, 2.5-5.8 GHz, mid-to-high frequency 28-31 GHz, and high frequency 76-77 GHz. These applications include PCS, 3G wireless (third generation cellular handset), the emerging MMDS (Multi-channel Multi-point Distribution Service) and LMDS (Local Multi-point Distribution Service), SATCOM (Satellite Communication), Smart Cruise Control in the Automobile industry, Point-to-Point Radio Link, Optical Communications, Fixed Wireless Communication, and Super Low Interference CATV (Cable TV). WIN Semiconductors Corporation demonstrated successfully Asia's first 6" 0.5um pHEMT wafer. We expect to produce the first 0.35um pHEMT MMIC wafer in the next month and the 0.15um pHEMT wafer within the next three months. We have recruited the best technical team in our company and this is one of our critical competitive advantages.